To reveal the intrinsic correlation between plasma parameters and thin film properties, this study systematically investigates the regulatory effects of different laser energies (200–500 mJ) on the ablation behavior of ZnO targets and the deposition process of nanostructures. First, optical emission spectroscopy (OES) was employed to diagnose and analyze the spectral characteristics of ZnO plasma during pulsed laser deposition (PLD). The results show that under different laser energies, the evolution trends of plasma electron temperature and electron density are consistent, with only numerical differences; both parameters increase with the elevation of laser energy. Notably, when the laser energy is 300 mJ, the spatial distribution of plasma electron density exhibits the optimal uniformity and stability.Furthermore, the deposited thin films were systematically characterized using multi-dimensional characterization methods (including morphology, phase, optical, electrical, and ultraviolet (UV) optoelectronic performance tests). The results indicate that when the laser energy is 300 mJ, the crystallinity and UV optoelectronic performance of the prepared ZnO films reach the optimal level.Through the correlation analysis between plasma characteristics and film properties, it can be preliminarily inferred that there exists a distinct intrinsic correlation between the spatial distribution stability of plasma electron density and film properties during the PLD process. Although the universality of this conclusion still requires support from more experimental data, this study provides important theoretical and experimental references for the subsequent in-depth exploration of the interaction mechanism between plasma parameters and film properties.