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中国物理学会期刊

不同堆垛石墨烯/氮化硼异质结的电子特性及压阻特性研究

Study on the Electronic and Piezo-Resistive Properties of Different Stacked Graphene/Boron Nitride Heterojunctions

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  • 石墨烯以其优异的电学特性、高载流子迁移率和良好的机械性能,在纳米电子器件领域展现出巨大的应用潜力。理论上看,本征石墨烯的狄拉克锥形能带结构赋予其独特的电学性质,然而,单独石墨烯由于缺乏支撑、对环境敏感等原因,其实际应用受到限制。近年来,与石墨烯结构相似的二维材料六方氮化硼(h-BN)被引入作为制备异质结的理想材料,不仅为石墨烯提供机械支撑和防护,还可打开石墨烯带隙并调控其电子输运性质,从而拓展其技术应用前景。本文提出通过构建不同堆垛方式的石墨烯/氮化硼异质结构以实现石墨烯压阻系数优化的方案。基于密度泛函理论和杂化密度泛函理论,采用第一性原理计算系统分析了不同堆垛构型下异质结的压阻性能。结果表明,所有构型在单轴应变下的压阻系数均显著高于双轴应变;G-BN2堆垛构型在两种应变条件下均表现出最高的压阻系数,这为石墨烯基压阻器件的设计提供了理论依据。

    Graphene holds great promise in the field of nanoelectronic devices owing to its high carrier mobility, excellent overall electrical properties, and good mechanical performance. Theoretically, the Dirac cone band structure of intrinsic graphene endows it with unique electrical properties. However, the utility of standalone graphene layers is limited by factors such as a lack of self-support and high environmental sensitivity in practical applications. In recent years, hexagonal boron nitride (h-BN), a two-dimensional material structurally analogous to graphene, has been introduced as an ideal material for fabricating heterostructures, which not only provides mechanical support and environmental protection for graphene but also modulates its band structures and electronic transport properties, thereby expanding its technological application prospects. This paper constructs three distinct stacking configurations of graphene/hexagonal boron nitride (h-BN) heterostructures and investigates their structural, electronic, and piezoresistive properties. The three stacking configurations along the c-axis are characterized as follows: carbon atoms aligned with both nitrogen and boron atoms (G-BN1), nitrogen atoms centered within the carbon hexagonal rings (G-BN2), and boron atoms centered within the hexagonal rings (G-BN3). Structural optimization of the heterostructures was performed based on the generalized gradient approximation (GGA) and density functional theory (DFT). Interlayer binding energy calculations reveal that G-BN2 exhibits the lowest binding energy, indicating relatively stronger interlayer interactions between graphene and h-BN in this stacking configuration. The band structures and density of states (DOS) of the three stacking configurations were calculated using the Heyd–Scuseria–Ernzerhof (HSE06) hybrid functional. The results indicate that the introduction of h-BN modulates the π-electron band structure of graphene, thereby inducing bandgap opening. In-plane uniaxial and biaxial tensile strains induced by external stress were simulated by increasing the lattice constants along the a-axis and along both the a- and b-axes, respectively. The band structure variations and piezoresistive properties of the three stacking configurations under these strain conditions were calculated. Compared to the unstrained structures, the bandgaps of all stacking heterostructures significantly increase under uniaxial strain but narrow under biaxial strain; additionally, graphene/h-BN heterostructures effectively enhance piezoresistive coefficient of graphene, and the anisotropic response of electronic orbitals leads to higher piezoresistive coefficients for all configurations under uniaxial strain. Among them, the G-BN2 stacking configuration exhibits the highest piezoresistive coefficient under both strain conditions. This study establishes a theoretical foundation for the future design of graphene-based piezoresistive devices.

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