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中国物理学会期刊

低压p-GaN HEMT晶体管重离子辐照效应研究

Study on Heavy Ion Irradiation Effects in Low-Voltage p-GaN HEMT Transistors

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  • 氮化镓高电子迁移率晶体管(GaN HEMT)作为第三代半导体器件的代表,在航空航天领域具有重要应用价值,但针对低压p-GaN HEMT的重离子辐照效应研究较为缺乏,亟需明确辐照引起器件退化的物理机理.本文针对40 V肖特基型p-GaN HEMT器件,研究了器件在关态条件下受到线性能量传输值为37.9 MeV·cm2/mg的84Kr18+重离子辐照引起的阈值电压和泄漏电流的退化现象及其机理.器件辐照过程中漏极瞬态电流呈现增长趋势、栅极瞬态电流呈现下降趋势;而器件在辐照后源漏之间漏电(Ids)增大大于两个数量级,阈值电压(Vth)最大负向漂移达0.26 V,漏极漏电(Idss)增大和栅极漏电(Igss)减小.通过TCAD仿真和能带理论分析,发现与大多数高压器件重离子损伤发生在漂移区或者缓冲层不同的是,该低压器件电学特性的退化可以归因于重离子辐照产生大量空穴在栅极附近积累,被在p-GaN层和AlGaN势垒层中的类施主型空穴陷阱(donor-like trap)俘获,降低了栅极下方沟道的电子势垒,从而造成泄漏电流增加.该研究对GaN器件在太空应用中的辐照可靠性评估具有参考意义.

    Gallium Nitride (GaN) High-Electron-Mobility Transistors (HEMTs) are emerging as critical components in aerospace power systems due to their superior radiation tolerance and high-frequency capabilities. While radiation effects on high-voltage devices are well documented, the degradation mechanisms of low-voltage p-GaN HEMTs remain less understood. This study investigates the Single Event Effects (SEE) and subsequent electrical degradation of commercial 40 V Schottky-type p-GaN HEMTs under 84Kr18+ heavy ion irradiation (LET = 37.9 MeV·cm2/mg). Experimental results indicate a Single Event Burnout (SEB) threshold of 52 V. Following irradiation under a safe off-state bias of 40 V, the device exhibited distinct degradation patterns: the drain-source leakage current (Ids) increased by over two orders of magnitude, and the threshold voltage (Vth) shifted negatively by 0.26 V. Conversely, the gate leakage current (Igss) showed an anomalous decrease. Combined TCAD simulations and energy band theory analysis reveal that, unlike high-voltage devices where damage typically occurs in the drift or buffer regions, degradation in these low-voltage devices is concentrated within the gate stack. The proposed mechanism attributes this to irradiation-induced holes accumulating near the gate and being captured by donor-like hole traps located in both the p-GaN layer (deep-level defects at EV + 2.8 eV) and the AlGaN barrier (EV + 0.7 eV). These trapped positive charges lower the electron potential barrier in the channel, causing the negative Vth shift and increased subthreshold leakage. Simultaneously, the compensation of acceptors in the p-GaN layer by these hole traps widens the depletion region of the Schottky junction, resulting in reduced gate leakage. These findings provide essential physical insights for the reliability assessment and radiation-hardening design of low-voltage GaN power modules for space applications.

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