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中国物理学会期刊

GeBi2Te4基外延薄膜的点缺陷调控及热电性能优化

Point Defect Engineering and Thermoelectric Performance Optimization of GeBi2Te4-Based Thin Films

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  • GeBi2Te4基化合物作为Bi2Te3基化合物的衍生物,具有低晶格热导率和高热电性能潜力。缺陷结构调控是GeBi2Te4性能优化的有效途径,然而缺陷结构的实验表征及其影响电输运的机制仍需实验来揭示。为了解决这一难题,本研究采用分子束外延技术在Al2O3(000l)衬底上成功制备出高结晶质量的GeBi2Te4(000l)基薄膜,并开展了本征缺陷结构的实验研究。结果发现,增加Bi束流会抑制GeBi和TeBi反位缺陷的形成,导致电子浓度呈现先增加后降低的趋势。Bi束流达到0.075 Å/s时将实现从GeBi2Te4向GeBi4Te7的物相转变。此时,薄膜保持高的迁移率(48.2 cm2V-1s-1),同时获得高达1.35 × 105 Sm-1的电导率以及接近114 μVK-1的Seebeck系数。最终,GeBi4Te7薄膜在300 K和400 K分别获得了优异的功率因子,达1.3 mWm-1K-2和1.7 mWm-1K-2,是目前GeBi2Te4基材料体系报道的最好水平之一。本研究为GeBi2Te4基材料的结构调控和性能优化提供了新思路。

    As a derivative of Bi2Te3-based compounds, GeBi2Te4-based materials have attracted intense attention for thermoelectric applications owing to their low lattice thermal conductivity originating from complex crystal structures and cation disorder. Point defects engineering serves as an effective strategy for optimizing thermoelectric performance of GeBi2Te4. However, experimental characterization of point defects and their influence on electrical transport properties still require further investigations. To address this issue, this study successfully fabricated a series of highly crystalline quality GeBi2Te4 (000l)-based thin films on Al2O3 (000l) substrates using molecular beam epitaxy (MBE) technique. The Bi flux was systematically varied from 0.035 Å/s to 0.075 Å/s to investigate its role in tuning intrinsic point defects and inducing possible phase structure transition. Reflection high-energy electron diffraction (RHEED) and X-ray diffraction (XRD) results demonstrated the high crystalline quality of GeBi2Te4 (000l)-based thin films. Scanning tunneling microscope (STM) measurements identified GeBi and TeBi antisite defects as the dominant point defects in GeBi2Te4. Angle-resolved photoemission spectroscopy (ARPES) was employed to probe the electronic band structure of GeBi2Te4 (000l) films, showing linearly dispersive topological surface states across bulk band gap and Fermi level (EF) positioned inside conduction band. The electron density first increased and then decreased as increasing the Bi flux, which agrees with the shift trend of EF revealed by ARPES, likely due to the synergistic effect of p-type GeBi and n-type TeBi antisite defects. Moreover, when the Bi flux reached 0.075 Å/s, the film phase transitioned from GeBi2Te4 to GeBi4Te7. The optimized GeBi4Te7 thin film exhibited the highest room-temperature carrier mobility of 48.2 cm2V-1s-1 among all films, and acquired excellent power factors of 1.3 mWm-1K-2 at 300 K and 1.7 mWm-1K-2 at 400 K, representing one of the highest values reported for GeBi2Te4-based materials. The key findings of this work lay on the direct visualization of intrinsic point defects and the discovery of high performance GeBi4Te7 with a high carrier effective mass. These results demonstrate that point defects engineering combined with phase structure regulation are effective for optimizing carrier transport and electrical properties of GeBi2Te4-based thin films and bulks.

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