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李志宏, 巩雁军, 吴东, 孙予罕, 王俊, 柳义, 董宝中

DETERMINATION OF THE AVERAGE THICKNESS OF INTERFACE LAYER WRAPPED ABOUT SiO2 SOLS BY SAXS

LI ZHI-HONG, GONG YAN-JUN, WU DONG, SUN YU-HAN, WANG JUN, LIU YI, DONG BAO-ZHONG
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  • 溶胶界面层厚度通常是用Porod法对高角区负偏离的Porod曲线进行拟合求算,但本文研究表明还可通过分别测定Porod负偏离校正前后体系粒子的平均半径之差而获得平均界面厚度.应用上述方法测定了在不同制备条件下制备的二氧化硅溶胶的平均界面厚度
    The average thickness of the interface layer wrapped about sols usually is determined by fitting the Porod curve that shows a negative deviation from Porod's law.In this paper we show that it could also be determined by a new method that includes the following steps:(1)determining the average radius R1 of the sol particles including interface layer from the small angle X-ray scattering data in which shows negative deviation from Porod's law;(2) determining the average radius R2 of the sol particles not including the interface layer from the scattering data in which has been corrected the negative deviation from Porod's law;(3) the difference ΔR between R1 and R2,i.e. ΔR=R1-R2,is just the average thickness of the interface layer wrapped about sols.By using the above method,the average thickness of the interface layer wrapped about SiO2 sols prepared under different conditions were determined.
      • 基金项目:国家杰出青年科学基金(批准号:29625307);国家自然科学基金(批准号:29973057);国家重点基础研究专项基金(批准号:G20000480)资助的课题.
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    出版历程
    • 收稿日期:2000-11-01
    • 修回日期:2000-12-07
    • 刊出日期:2001-03-05

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