Molecular dynamics study on high-temperature oxidation behavior of silicon carbide surfaces exposed to water/oxygen mixtures

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WANG Guangshuo; PENG Jinlong; YE Xinbin; YANG Chao; ZHANG Yonghao; SUN Quanhua; LIN Xin; HU Yuan

doi:10.7498/aps.75.20251753

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WANG Guangshuo, PENG Jinlong, YE Xinbin, YANG Chao, ZHANG Yonghao, SUN Quanhua, LIN Xin, HU Yuan. Molecular dynamics study on high-temperature oxidation behavior of silicon carbide surfaces exposed to water/oxygen mixtures. Acta Physica Sinica, 2026, 75(10): 100302. DOI: 10.7498/aps.75.20251753

Citation:

WANG Guangshuo, PENG Jinlong, YE Xinbin, YANG Chao, ZHANG Yonghao, SUN Quanhua, LIN Xin, HU Yuan. Molecular dynamics study on high-temperature oxidation behavior of silicon carbide surfaces exposed to water/oxygen mixtures. Acta Physica Sinica, 2026, 75(10): 100302. DOI: 10.7498/aps.75.20251753

Citation:

WANG Guangshuo, PENG Jinlong, YE Xinbin, YANG Chao, ZHANG Yonghao, SUN Quanhua, LIN Xin, HU Yuan. Molecular dynamics study on high-temperature oxidation behavior of silicon carbide surfaces exposed to water/oxygen mixtures. Acta Physica Sinica, 2026, 75(10): 100302. DOI: 10.7498/aps.75.20251753