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Lü Chun-Jing, Han Yi-Ping.Analysis of propagation characteristics of Gaussian beams in turbulent plasma sheaths. Acta Physica Sinica, 2019, 68(9): 094201.doi:10.7498/aps.68.20182169 |
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Yang Liang, Zhang Jun-Long, Yan Hui-Jie, Hua Yue, Ren Chun-Sheng.Experimental study on coaxial gun pulse discharge plasma density change in transport process. Acta Physica Sinica, 2017, 66(5): 055203.doi:10.7498/aps.66.055203 |
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Zhang Yi-Chuan, Yang Kuan, Li Huan, Zhu Xiao-Dong.Application of inductively coupled microplasma jet on rapid manufacturing. Acta Physica Sinica, 2016, 65(14): 145201.doi:10.7498/aps.65.145201 |
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Fang Jia, Li Shuang-Liang, Xu Sheng-Zhi, Wei Chang-Chun, Zhao Ying, Zhang Xiao-Dan.Analysis on steady plasma process of high-rate microcrystalline silicon by optical emission spectroscopy. Acta Physica Sinica, 2013, 62(16): 168103.doi:10.7498/aps.62.168103 |
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Wang Feng, Wu Wei-Dong, Jiang Xiao-Dong, Tang Yong-Jian.Surface crystallization of amorphous fused silica during electron cyclotron resonance plasma etching. Acta Physica Sinica, 2012, 61(2): 024206.doi:10.7498/aps.61.024206 |
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Ke Bo, Wang Lei, Ni Tian-Ling, Ding Fang, Chen Mu-Di, Zhou Hai-Yang, Wen Xiao-Hui, Zhu Xiao-Dong.Effects of radio-frequency bias on silicon oxide films deposited by dual electron cyclotron resonance-radio frequency hybrid plasma. Acta Physica Sinica, 2010, 59(2): 1338-1343.doi:10.7498/aps.59.1338 |
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Liu Cheng-Sen, Wang De-Zhen, Liu Tian-Wei, Wang Yan-Hui.Two-dimensional particle-in-cell simulation of the ion sheath dynamics in plasma source ion implantation of a hemispherical bowl-shaped target. Acta Physica Sinica, 2008, 57(10): 6450-6456.doi:10.7498/aps.57.6450 |
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Zhang Fa-Rong, Zhang Xiao-Dan, Amanatides E., Mataras D., Zhao Jing, Zhao Ying.Study on the optical and electrical properties of plasma for the deposition of microcrystalline silicon. Acta Physica Sinica, 2008, 57(5): 3022-3026.doi:10.7498/aps.57.3022 |
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Wang Li-Shi, Pan Chun-Xu, Cai Qi-Zhou, Wei Bo-Kang.Study of the heat effect of single steady-state microdischarge during plasma electrolytic oxidation. Acta Physica Sinica, 2007, 56(9): 5341-5346.doi:10.7498/aps.56.5341 |
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Wang Xiao-Qiang, Li Jun-Shuai, Chen Qiang, Qi Jing, Yin Min, He De-Yan.Aluminum-induced crystallization during deposition of silicon films by inductively coupled plasma CVD. Acta Physica Sinica, 2005, 54(1): 269-273.doi:10.7498/aps.54.269 |
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Zhang Duan-Ming, Guan Li, Li Zhi-Hua, Zhong Zhi-Cheng, Hou Si-Pu, Yang Feng-Xia, Zheng Ke-Yu.Study on the evolvement of plasma generated by pulsed laser deposition of thin film. Acta Physica Sinica, 2003, 52(1): 242-246.doi:10.7498/aps.52.242 |
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Tang Hua, Guo Hong, Liu Ming-Wei, Qiu Yun-Li, Deng Dong-Mei.Theoretical and numerical investigation for propagation of ultrashort intense l aser pulse in plasma channel. Acta Physica Sinica, 2003, 52(9): 2170-2175.doi:10.7498/aps.52.2170 |
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Hong Xue-Ren, Duan Wen-Shan, Sun Jian-An, Shi Yu-Ren, Lü Ke-Pu.The propagation of solitons in an inhomogeneous dusty plasma. Acta Physica Sinica, 2003, 52(11): 2671-2677.doi:10.7498/aps.52.2671 |
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Liu Cheng Sen, Wang De Zhen.Plasma source ion implantation near the end of a cylindrical bore using an auxiliary electrode for finite rise time voltage pulses. Acta Physica Sinica, 2003, 52(1): 109-114.doi:10.7498/aps.52.109 |
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