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Qi Liang-Wen, Du Man-Qiang, Wen Xiao-Dong, Song Jian, Yan Hui-Jie.Study on the plasma dynamics and impurity spectral characteristics of coaxial gun discharge. Acta Physica Sinica, 2024, 0(0): .doi:10.7498/aps.73.20240760 |
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Yin Jia-Peng, Liu Sheng-Guang.A single long electron bunch detect electromagnetic field evolution in laser plasma. Acta Physica Sinica, 2022, 71(1): 012901.doi:10.7498/aps.71.20211374 |
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Chen Ze-Yu, Peng Yu-Bin, Wang Rui, He Yong-Ning, Cui Wan-Zhao.Reaction dynamic process of low pressure discharge plasma in microwave resonant cavity. Acta Physica Sinica, 2022, 71(24): 240702.doi:10.7498/aps.71.20221385 |
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Liu Shuai, Huang Yi-Zhi, Guo Hai-Shan, Zhang Yong-Peng, Yang Lan-Jun.Plasma dynamic characteristics of a parallel-rail accelerator. Acta Physica Sinica, 2018, 67(6): 065201.doi:10.7498/aps.67.20172403 |
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Yu Jue-Zhi, Hu Yong-Sheng, Li Hong, Huang Xue-Jie, Chen Li-Quan.Radical anion based liquid electrode materials. Acta Physica Sinica, 2017, 66(8): 088201.doi:10.7498/aps.66.088201 |
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Cai Ji-Xing, Guo Ming, Qu Xu, Li He, Jin Guang-Yong.Gas dynamics and combustion wave expanding velocity of laser induced plasma. Acta Physica Sinica, 2017, 66(9): 094202.doi:10.7498/aps.66.094202 |
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Guo Lian-Bo, Hao Rong-Fei, Hao Zhong-Qi, Li Kuo-Hu, Shen Meng, Ren Zhao, Li Xiang-You, Zeng Xiao-Yan.Study on the emission spectrum of AlO radical B2+X2+ transition using laser-induced breakdown spectroscopy. Acta Physica Sinica, 2013, 62(22): 224211.doi:10.7498/aps.62.224211 |
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Zhou Xiang, Zhang Xuan, Liu Ai-Fen, Zeng Xiang-Hua.Structure of FC(O)O2 and the mechanism of its reaction with NO. Acta Physica Sinica, 2010, 59(7): 5128-5134.doi:10.7498/aps.59.5128 |
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Zhang Hong-Wei, Chen Gai-Rong, Zhang Li-Wei, Lu Jing-Xiao, Wen Shu-Tang.A kinetic model for silicon film growth by silane/hydrogen glow discharge. Acta Physica Sinica, 2010, 59(7): 4901-4910.doi:10.7498/aps.59.4901 |
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Shi De-Heng, Zhang Jin-Ping, Sun Jin-Feng, Liu Yu-Fang, Zhu Zun-Lüe.Analytic potential energy function of the SiH2(C2v, X1A1) radical using CCSD(T) theory in combination with quintuple correlation-consistent basis set. Acta Physica Sinica, 2009, 58(8): 5329-5334.doi:10.7498/aps.58.5329 |
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Feng Xing, Zhu Zheng-He, Liu Xiao-Ya, Yang Xiang-Dong, Huang Wei.Theoretical study on molecular reaction dynamics of the SiH2 system. Acta Physica Sinica, 2009, 58(12): 8217-8223.doi:10.7498/aps.58.8217 |
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Zhao Jiang, Cui Lei, Zeng Xiang-Hua, Xu Xiu-Lian.Theoretical study on the reaction mechanism of the reaction of FC(O)O with NO. Acta Physica Sinica, 2008, 57(11): 7349-7353.doi:10.7498/aps.57.7349 |
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Qi Jing, Jin Jing, Hu Hai-Long, Gao Ping-Qi, Yuan Bao-He, He De-Yan.Effect of H2 on polycrystalline Si films deposited by plasma-enhanced CVD using Ar-diluted SiH4. Acta Physica Sinica, 2006, 55(11): 5959-5963.doi:10.7498/aps.55.5959 |
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CANG YU, WANG WEI, ZHANG JIE.DYNAMICS OF INTERACTION OF ULTRASHORT LASER PULSES WITH SOLID TARGETS. Acta Physica Sinica, 2001, 50(9): 1742-1746.doi:10.7498/aps.50.1742 |
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XIA JIANG-FAN, ZHANG JUN, ZHANG JIE.MODELING THE ASTROPHYSICAL DYNAMICAL PROCESS WITH LASER-PLASMAS. Acta Physica Sinica, 2001, 50(5): 994-1000.doi:10.7498/aps.50.994 |
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SHENG ZHENG-MING, XU ZHI-ZHAN, MA JIN-XIU, YU WEI.KINETIC EQUATION AND TRANSPORTS OF PLASMA IN A CIRCULARLY-POLARIZED INTENSE LASER FIELD. Acta Physica Sinica, 1994, 43(1): 37-46.doi:10.7498/aps.43.37 |
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YU WEI, LI XIAO-WEI, HAN LI, ZHANG LIAN-SHUI, FU GUANG-SHENG.A STUDY ON DISSOCIATION KINETICS OF SiH4+CH4 PLASMA INDUCED BY PULSED INFRARED LASER. Acta Physica Sinica, 1994, 43(11): 1889-1898.doi:10.7498/aps.43.1889 |
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LI XIAO-WEI, FU GUANG-SHENG, HAN LI, ZHANG LIAN-SHUI, Lü FU-RUN, WANG JIN-GUO.PROFILES OF H BALMER LINES EMITTING FROM A LASER-INDUCED SILANE PLASMA. Acta Physica Sinica, 1993, 42(1): 58-65.doi:10.7498/aps.42.58 |
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LIU ZU-LI, SONG WEN-DONG, WEI HE-LIN, LI ZAI-GUANG.A STUDY ON DYNAMICS OF dc GLOW DISCHARGE PLASMA AT AXIAL DIRECTION. Acta Physica Sinica, 1992, 41(1): 56-61.doi:10.7498/aps.41.56 |
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LU QING-ZHENG, DING CHUAN-FAN, GAO JIAN-MI, KONG FAN-AO.A ROTATIONAL ANALYSIS OF UV MULTIPHOTON IONIZATION SPECTRUM OF SiH4. Acta Physica Sinica, 1991, 40(1): 39-42.doi:10.7498/aps.40.39 |
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