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Luo Ling-Feng, Yang Juan, Geng Hai, Wu Xian-Ming, Mou Hao.Numerical simulation of magnetic field influence on plasma and electron extraction of electron cyclotron resonance neutralizer. Acta Physica Sinica, 2024, 73(16): 165203.doi:10.7498/aps.73.20240612 |
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Li Xin, Zeng Ming, Liu Hui, Ning Zhong-Xi, Yu Da-Ren.Iodine electron cyclotron resonance plasma source for electric propulsion. Acta Physica Sinica, 2023, 72(22): 225202.doi:10.7498/aps.72.20230785 |
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Xia Xu, Yang Juan, Fu Yu-Liang, Wu Xian-Ming, Geng Hai, Hu Zhan.Numerical simulation of influence of magnetic field on plasma characteristics and surface current of ion source of 2-cm electron cyclotron resonance ion thruster. Acta Physica Sinica, 2021, 70(7): 075204.doi:10.7498/aps.70.20201667 |
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Yuan Zhong-Cai, Shi Jia-Ming.Theoretical and numerical studies on interactions between high-power microwave and plasma. Acta Physica Sinica, 2014, 63(9): 095202.doi:10.7498/aps.63.095202 |
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Zhou Qian-Hong, Dong Zhi-Wei, Chen Jing-Yuan.Modeling of plasma pattern formation in 110 GHz microwave air breakdown. Acta Physica Sinica, 2011, 60(12): 125202.doi:10.7498/aps.60.125202 |
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Gao Bi-Rong, Liu Yue.Numerical study on uniformity of electron cyclotron resonance plasma density. Acta Physica Sinica, 2011, 60(4): 045201.doi:10.7498/aps.60.045201 |
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Lu Hong-Wei, Hu Li-Qun, Zhou Rui-Jie, Xu Ping, Zhong Guo-Qiang, Lin Shi-Yao, Wang Shao-Feng.Runaway electrons behaviors during ion cycolotron range of frequency and lower hybrid wave plasmas in the HT-7 Tokamak. Acta Physica Sinica, 2010, 59(10): 7175-7181.doi:10.7498/aps.59.7175 |
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Ke Bo, Wang Lei, Ni Tian-Ling, Ding Fang, Chen Mu-Di, Zhou Hai-Yang, Wen Xiao-Hui, Zhu Xiao-Dong.Effects of radio-frequency bias on silicon oxide films deposited by dual electron cyclotron resonance-radio frequency hybrid plasma. Acta Physica Sinica, 2010, 59(2): 1338-1343.doi:10.7498/aps.59.1338 |
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Yang Juan, Shi Feng, Yang Tie-Lian, Meng Zhi-Qiang.Numerical simulation on the plasma field within discharge chamber of electron cyclotron resonance ion thruster. Acta Physica Sinica, 2010, 59(12): 8701-8706.doi:10.7498/aps.59.8701 |
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Wang Ye-An, Qin Fu-Wen, Wu Dong-Jiang, Wu Ai-Min, Xu Yin, Gu Biao.Analysis of diluted magnetic semiconductor GaMnN grown by electron cyclotron resonance-plasma enhanced metal organic chemical vapor deposition. Acta Physica Sinica, 2008, 57(1): 508-513.doi:10.7498/aps.57.508 |
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Gong Xue-Yu, Peng Xiao-Wei, Xie An-Ping, Liu Wen-Yan.Electron cyclotron current drive under different operational regimes in tokamak plasma. Acta Physica Sinica, 2006, 55(3): 1307-1314.doi:10.7498/aps.55.1307 |
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Li Hong, Su Tie, Ouyang Liang, Wang Hui-Hui, Bai Xiao-Yan, Chen Zhi-Peng, Liu Wan-Dong.Numerical simulation of plasma of large-dimensions produced by injecting electron beam into air. Acta Physica Sinica, 2006, 55(7): 3506-3513.doi:10.7498/aps.55.3506 |
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Wu Zhen-Yu, Yang Yin-Tang, Wang Jia-You.Study of fluorinated amorphous carbon films prepared by electron cyclotron resonance chemical vapor deposition. Acta Physica Sinica, 2006, 55(5): 2572-2577.doi:10.7498/aps.55.2572 |
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Chen Zhuo, He Wei, Pu Yi-Kang.Measurement of metastable state densities and electron temperatures in an electron cyclotron resonance argon plasma. Acta Physica Sinica, 2005, 54(5): 2153-2157.doi:10.7498/aps.54.2153 |
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Ye Chao, Du Wei, Ning Zhao-Yuan, Cheng Shan-Hua.Effect of grid and bias on the characteristic of CHF3 electron cyclot ron resonance discharge plasma. Acta Physica Sinica, 2003, 52(7): 1802-1807.doi:10.7498/aps.52.1802 |
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NING ZHAO-YUAN, CHENG SHAN-HUA, YE CHAO.CHEMICAL BONDING STRUCTURE OF FLUORINATED AMORPHOUS CARBON FILMS PREPARED BY ELECTRON CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR DEPOSITION. Acta Physica Sinica, 2001, 50(3): 566-571.doi:10.7498/aps.50.566 |
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YE CHAO, NING ZHAO-YUAN, CHENG SHAN-HUA.OPTICAL PROPERTIES OF AMORPHOUS FLUORINATED CARBON FILMS PREPARED BY ELECTRON CYCLOTRON RESONANCE PLASMA. Acta Physica Sinica, 2001, 50(10): 2017-2022.doi:10.7498/aps.50.2017 |
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YE CHAO, NING ZHAO-YUAN, CHENG SHAN-HUA, KANG JIAN.STUDY ON α-C∶F FILMS DEPOSITED BY ELECTRON CYCLOTRONRESONANCE PLASMA CHEMICAL VAPOR DEPOSITION. Acta Physica Sinica, 2001, 50(4): 784-789.doi:10.7498/aps.50.784 |
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Liu Ming-Hai, Hu Xi-Wei, Wu Qin-Chong, Yu Guo-Yang.. Acta Physica Sinica, 2000, 49(3): 497-501.doi:10.7498/aps.49.497 |
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DU XIAO-LONG, CHEN GUANG-CHAO, JIANG DE-YI, YAO XIN-ZI, ZHU HE-SUN.PROPERTIES OF ELECTRON CYCLOTRON RESONANCE PLASMAS AND THEIR INFLUENCE ON THE DEPOSITION OF GaN FILMS. Acta Physica Sinica, 1999, 48(2): 257-266.doi:10.7498/aps.48.257 |
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