| [1] |
Liu Qing-Bin, Yu Cui, Guo Jian-Chao, Ma Meng-Yu, He Ze-Zhao, Zhou Chuang-Jie, Gao Xue-Dong, Yu Hao, Feng Zhi-Hong.Influence of polycrystalline diamond on silicon-based GaN material. Acta Physica Sinica, 2023, 72(9): 098104.doi:10.7498/aps.72.20221942 |
| [2] |
Song Liu-Qin, Jia Wen-Zhu, Dong Wan, Zhang Yi-Fan, Dai Zhong-Ling, Song Yuan-Hong.Numerical investigation of SiO2film deposition enhanced by capacitively coupled discharge plasma. Acta Physica Sinica, 2022, 71(17): 170201.doi:10.7498/aps.71.20220493 |
| [3] |
Li Shu-Ping, Zhang Zhi-Li, Fu Kai, Yu Guo-Hao, Cai Yong, Zhang Bao-Shun.High-performance AlGaN/GaN MIS-HEMT device based on in situ plasma nitriding and low power chemical vapor deposition Si3N4 gate dielectrics. Acta Physica Sinica, 2017, 66(19): 197301.doi:10.7498/aps.66.197301 |
| [4] |
Tan Zai-Shang, Wu Xiao-Meng, Fan Zhong-Yong, Ding Shi-Jin.Effect of thermal annealing on the structure and properties of plasma enhanced chemical vapor deposited SiCOH film. Acta Physica Sinica, 2015, 64(10): 107701.doi:10.7498/aps.64.107701 |
| [5] |
Liu Li-Ying, Zhang Jia-Liang, Guo Qing-Chao, Wang De-Zhen.Diagnostics of the atmospheric pressure plasma jets for plasma enhanced chemical vapor deposition of polycrystalline silicon thin film. Acta Physica Sinica, 2010, 59(4): 2653-2660.doi:10.7498/aps.59.2653 |
| [6] |
Liu Yan-Yan, Bauer-Grosse E., Zhang Qing-Yu.Structure and growth behavior of low N-doped diamond film by microwave plasma assisted chemical vapor deposition. Acta Physica Sinica, 2007, 56(4): 2359-2368.doi:10.7498/aps.56.2359 |
| [7] |
Yu Wei, Wang Bao-Zhu, Yang Yan-Bin, Lu Wan-Bing, Fu Guang-Sheng.Optical emission diagnosis of helicon-wave-plasma-enhanced chemical vapor deposition of nanocrystalline silicon. Acta Physica Sinica, 2005, 54(5): 2394-2398.doi:10.7498/aps.54.2394 |
| [8] |
Zeng Xiang－Bo, Liao Xian－Bo, Wang Bo, Diao Hong－Wei, Dai Song－Tao, Xiang Xian－Bi, Chang Xiu－Lan, Xu Yan－Yue, Hu Zhi－Hua, Hao Hui－Ying, Kong Guang－Lin.Boron-doped silicon nanowires grown by plasmaenhanced chemical vapor deposition. Acta Physica Sinica, 2004, 53(12): 4410-4413.doi:10.7498/aps.53.4410 |
| [9] |
Wang Miao, Li Zhen-Hua, Takegawa Hitosi, Saito Yahachi.Study on the definite direction growth of carbon nanotubes by the microwave plasma-enhanced chemical vapro phase deposition. Acta Physica Sinica, 2004, 53(3): 888-890.doi:10.7498/aps.53.888 |
| [10] |
Yang Wu-Bao, Wang Jiu-Li, Zhang Gu-Ling, Fan Song-Hua, Liu Chi-Zi, Yang Si-Ze.Diamond-like carbon films deposited on optical glass substrate by using ECR microwave acetone plasma CVD method. Acta Physica Sinica, 2004, 53(9): 3099-3103.doi:10.7498/aps.53.3099 |
| [11] |
Yu Wei, Liu Li-Hui, Hou Hai-Hong, Ding Xue-Cheng, Han Li, Fu Guang-Sheng.Silicon nitride films prepared by helicon wave plasam-enhanced chemical vapour deposition. Acta Physica Sinica, 2003, 52(3): 687-691.doi:10.7498/aps.52.687 |
| [12] |
Yang Hui-Dong, Wu Chun-Ｙa, Zhao Ying, Xue Jun-Ｍing, Geng Xin-Ｈua, Xiong Shao-Ｚhen.Investigation on the oxygen contamination in the μc-Si∶H thin film deposited b y VHF-PECVD. Acta Physica Sinica, 2003, 52(11): 2865-2869.doi:10.7498/aps.52.2865 |
| [13] |
CHEN XIAO-HUA, WU GUO-TAO, DENG FU-MING, WANG JIAN-XIONG, YANG HANG-SHENG, WANG MIAO, LU XIAO-NAN, PENG JING-CUI, LI WEN-ZHU.GROWING CARBON BUCKONIONS BY RADIO FREQUENCY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION. Acta Physica Sinica, 2001, 50(7): 1264-1267.doi:10.7498/aps.50.1264 |
| [14] |
NING ZHAO-YUAN, CHENG SHAN-HUA, YE CHAO.CHEMICAL BONDING STRUCTURE OF FLUORINATED AMORPHOUS CARBON FILMS PREPARED BY ELECTRON CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR DEPOSITION. Acta Physica Sinica, 2001, 50(3): 566-571.doi:10.7498/aps.50.566 |
| [15] |
HU YING.SiC NANOWIRES GROWN ON SILICON(100) WAFER BY MPCVD METHOD. Acta Physica Sinica, 2001, 50(12): 2452-2455.doi:10.7498/aps.50.2452 |
| [16] |
YE CHAO, NING ZHAO-YUAN, CHENG SHAN-HUA, KANG JIAN.STUDY ON α-C∶F FILMS DEPOSITED BY ELECTRON CYCLOTRONRESONANCE PLASMA CHEMICAL VAPOR DEPOSITION. Acta Physica Sinica, 2001, 50(4): 784-789.doi:10.7498/aps.50.784 |
| [17] |
XIN YU, FAN SHU-PING, DI GUO-QING, SHEN MING-RONG, GAN ZHAO-QIANG.STUDIES OF CNx FILMS DEPOSITED BY MEANS OF MICROWAVE PLASMA CVD METHOD. Acta Physica Sinica, 1998, 47(1): 154-159.doi:10.7498/aps.47.154 |
| [18] |
WU DA-WEI, HE MENG-BING, GUO HUAI-XI, LUO HAI-LIN, ZHANG ZHI-HONG, FU DE-JUN, FAN XIANG-JUN.STRUCTURE AND CHARACTERISTICS OF C3N4 THIN FILMS. Acta Physica Sinica, 1997, 46(3): 530-535.doi:10.7498/aps.46.530 |
| [19] |
Wei He-Lin, Liu Zu-Li.. Acta Physica Sinica, 1995, 44(8): 1237-1243.doi:10.7498/aps.44.1237 |
| [20] |
LIU ZU-LI, ZHU DA-QI, SONG WEN-DONG, CHEN JUN-FANG.A MASS TRANSFER MODEL FOR THE PLASMA DEPOSITION PROCESS IN AXIAL-FLOW REACTOR. Acta Physica Sinica, 1992, 41(4): 617-622.doi:10.7498/aps.41.617 |
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