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Polarization detection is a fundamental way to obtain the vectorial nature of light, supporting advanced technologies in the fields of optical communication, intelligent sensing, and biosensing. Two-dimensional van der Waals materials have become a promising platform for high-performance polarization-sensitive photodetectors due to their inherent anisotropy and tunable electronic properties. Nevertheless, their intrinsically weak light absorption and limited photoresponse efficiency remain major bottlenecks. Plasmonic nanostructures, which can achieve strong localized field confinement and manipulation on a nanoscale, provide an effective strategy to overcome these limitations and substantially improve device performance. In this review, we systematically summarize the coupling mechanisms between plasmonic architectures and vdW materials, highlighting near-field enhancement, plasmon-induced hot-carrier generation, and mode-selective polarization coupling as key physical processes for enhancing photocarrier generation and polarization extinction. Representative devices including metallic gratings, hybrid nanoantennas, and chiral metasurfaces are compared in terms of responsivity, detection speed, operating bandwidth, and polarization extinction ratio, revealing consistent improvements of one to two orders of magnitude over bare vdW devices. We further survey emerging applications in the fields of high-speed polarization-encoded optical communication, on-chip optical computing and information processing, and bioinspired vision and image recognition systems, where plasmonic-vdW hybrid detectors demonstrate unique advantages in miniaturization and energy efficiency. Finally, we discuss current challenges such as large-scale fabrication of uniform plasmonic arrays, spectral bandwidth broadening, and seamless integration with complementary photonic circuits, and outline future opportunities for next-generation polarization-resolved optoelectronic platforms.
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Keywords:
- polarization detection /
- plasmonics /
- van der Waals materials /
- surface plasmon polariton /
- localized surface plasmon resonance
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等离激元结构 二维材料 增强机制 响应度/(A·W–1) 探测率D*/Jones 响应时间 偏振比 响应光谱范围 文献 各向异性纳米结构 BP LSPR 802.42 — 6.36 ps 118.4 615—740 nm
765—865 nm[63] BP LSPR 14.2 — < 90 μs 8.7 1.55—4 μm [65] MoS2/In2Se3 SPPs 28.5 9.81×1012 上升: 195 ns
下降: 222 ns1.88 近红外波段 [68] 周期性光栅 ReS2/WSe2 Mie scattering 27.3 — 3.7 ms 12.6 405—532 nm [59] 石墨烯 SPPs 2.95 0.28×107 上升: 39 ms
下降: 32.1 ms6.65 635—1550 nm [61] In2Se3 SPPs 0.53 2.5×1010 上升: 380 μs
下降: 300 μs–1.1 633 nm至
近红外波段[72] 手性结构 In2Se3 LSPR 0.19 — 上升: 320 μs
下降: 425 μs1.6×104 500—1100 nm [76] 石墨烯 LSPR 15.6 — < 667 ns ≥ 1 中红外波段 [77] MoS2 SPPs ~1×10–4 — 上升: 14 μs
下降: 11 μs3 1200—1600 nm [95] 
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