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Su Yuan-Jun, Xu Jun, Zhu Ming, Fan Peng-Hui, Dong Chuang.Hydrogenated poly-crystalline silicon thin films deposited by inductively coupled plasma assisted pulsed dc twin magnetron sputtering. Acta Physica Sinica, 2012, 61(2): 028104.doi:10.7498/aps.61.028104 |
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Lin Zhi-Yu, Zhang Jin-Cheng, Xu Sheng-Rui, Lü Ling, Liu Zi-Yang, Ma Jun-Cai, Xue Xiao-Yong, Xue Jun-Shuai, Hao Yue.TEM study of GaN films on vicinal sapphire (0001) substrates by MOCVD. Acta Physica Sinica, 2012, 61(18): 186103.doi:10.7498/aps.61.186103 |
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Qiu Dong-Jiang, Fan Wen-Zhi, Weng Sheng, Wu Hui-Zhen, Wang Jun.Surface-plasmon-mediated emission enhancement from Ag-capped ZnO thin films. Acta Physica Sinica, 2011, 60(8): 087301.doi:10.7498/aps.60.087301 |
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Shen Wu-Lin, Ma Zhi-Bin, Tan Bi-Song, Wu Jun, Wang Jian-Hua.Magnetoelectric heating in the ECR plasma. Acta Physica Sinica, 2011, 60(10): 105204.doi:10.7498/aps.60.105204 |
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Sui Cheng-Hua, Cai Ping-Gen, Chen Nai-Bo, Wei Gao-Yao, Xu Xiao-Jun, Zhou Hong.The temperature-dependent optical properties of ZnO film deposited on sapphire fiber-ending. Acta Physica Sinica, 2009, 58(4): 2792-2796.doi:10.7498/aps.58.2792 |
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Ding Wan-Yu, Xu Jun, Lu Wen-Qi, Deng Xin-Lu, Dong Chuang.An XPS study on the structure of SiNx film deposited by microwave ECR magnetron sputtering. Acta Physica Sinica, 2009, 58(6): 4109-4116.doi:10.7498/aps.58.4109 |
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Liu Ming, Liu Zhi-Wen, Gu Jian-Feng, Qin Fu-Wen, Ma Chun-Yu, Zhang Qing-Yu.Effect of sapphire substrate pre-treatment on the growth of ZnO films. Acta Physica Sinica, 2008, 57(2): 1133-1140.doi:10.7498/aps.57.1133 |
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Liu Feng, Meng Yue-Dong, Ren Zhao-Xing, Shu Xing-Sheng.Characterization of ZrN films deposited by ICP enhanced RF magnetron sputtering. Acta Physica Sinica, 2008, 57(3): 1796-1801.doi:10.7498/aps.57.1796 |
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Liu Yan-Yan, Bauer-Grosse E., Zhang Qing-Yu.Structure and growth behavior of low N-doped diamond film by microwave plasma assisted chemical vapor deposition. Acta Physica Sinica, 2007, 56(4): 2359-2368.doi:10.7498/aps.56.2359 |
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.Experimental study on attenuation of differently polarized wave by microwave plasma jet in vacuum. Acta Physica Sinica, 2007, 56(12): 7120-7126.doi:10.7498/aps.56.7120 |
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Yuan Jin-She, Chen Guang-De.Instantaneous relaxation of photoconductivity in GaN film grown on vicinal sapphire substrate by MBE. Acta Physica Sinica, 2007, 56(7): 4218-4223.doi:10.7498/aps.56.4218 |
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Li Yong, Sun Cheng-Wei, Liu Zhi-Wen, Zhang Qing-Yu.Study of ZnO film growth by reactive magnetron sputtering using plasma emission spectra. Acta Physica Sinica, 2006, 55(8): 4232-4237.doi:10.7498/aps.55.4232 |
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Ding Wan-Yu, Xu Jun, Li Yan-Qin, Piao Yong, Gao Peng, Deng Xin-Lü, Dong Chuang.Characterization of silicon nitride films prepared by MW-ECR magnetron sputtering. Acta Physica Sinica, 2006, 55(3): 1363-1368.doi:10.7498/aps.55.1363 |
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Zhang Dong-Ping, Qi Hong-Ji, Shao Jian-Da, Fan Rui-Ying, Fan Zheng-Xiu.Mechanism of nodule growth in ion beam sputtering films. Acta Physica Sinica, 2005, 54(3): 1385-1389.doi:10.7498/aps.54.1385 |
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Wang Miao, Li Zhen-Hua, Takegawa Hitosi, Saito Yahachi.Study on the definite direction growth of carbon nanotubes by the microwave plasma-enhanced chemical vapro phase deposition. Acta Physica Sinica, 2004, 53(3): 888-890.doi:10.7498/aps.53.888 |
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Yang Wu-Bao, Wang Jiu-Li, Zhang Gu-Ling, Fan Song-Hua, Liu Chi-Zi, Yang Si-Ze.Diamond-like carbon films deposited on optical glass substrate by using ECR microwave acetone plasma CVD method. Acta Physica Sinica, 2004, 53(9): 3099-3103.doi:10.7498/aps.53.3099 |
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Wang Jian-Ping, Hao Yue, Peng Jun, Zhu Zuo-Yun, Zhang Yong-Hua.. Acta Physica Sinica, 2002, 51(8): 1793-1797.doi:10.7498/aps.51.1793 |
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ZHANG YONG-PING, GU YOU-SONG, GAO HONG-JUN, ZHANG XIU-FANG.STRUCTURAL CHARACTERIZATION OF C3N4 THIN FILMS SYNTHESIZED BY MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION. Acta Physica Sinica, 2001, 50(7): 1396-1400.doi:10.7498/aps.50.1396 |
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HU YING.SiC NANOWIRES GROWN ON SILICON(100) WAFER BY MPCVD METHOD. Acta Physica Sinica, 2001, 50(12): 2452-2455.doi:10.7498/aps.50.2452 |
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YAO XIN-ZI, ZU QIN-XIN, XU YAO, GAO PENG, HU FENG-JIE, LI BAO-HUAN.THE MEASUREMENT OF ELECTRON TEMPERATURE OF PLASMA BY LASER SCATTERING AND THE ENERGY LOSS OF θ-PINCH PLASMA. Acta Physica Sinica, 1979, 28(6): 824-832.doi:10.7498/aps.28.824 |
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