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Tan Zai-Shang, Wu Xiao-Meng, Fan Zhong-Yong, Ding Shi-Jin.Effect of thermal annealing on the structure and properties of plasma enhanced chemical vapor deposited SiCOH film. Acta Physica Sinica, 2015, 64(10): 107701.doi:10.7498/aps.64.107701 |
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Mu Zong-Xin, Mu Xiao-Dong, Wang Chun, Jia Li, Dong Chuang.Analysis on the ionization of high power pulsed unbalanced magnetron sputtering powered by direct current. Acta Physica Sinica, 2011, 60(1): 015204.doi:10.7498/aps.60.015204 |
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Ding Yan-Li, Zhu Zhi-Li, Gu Jin-Hua, Shi Xin-Wei, Yang Shi-E, Gao Xiao-Yong, Chen Yong-Sheng, Lu Jing-Xiao.Effect of deposition rate on the scaling behavior of microcrystalline silicon films prepared by very high frequency-plasma enhanced chemical vapor deposition. Acta Physica Sinica, 2010, 59(2): 1190-1195.doi:10.7498/aps.59.1190 |
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Liu Li-Ying, Zhang Jia-Liang, Guo Qing-Chao, Wang De-Zhen.Diagnostics of the atmospheric pressure plasma jets for plasma enhanced chemical vapor deposition of polycrystalline silicon thin film. Acta Physica Sinica, 2010, 59(4): 2653-2660.doi:10.7498/aps.59.2653 |
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Weng Su-Ming, Sheng Zheng-Ming, Zhang Jie.Generation of plasma current under arbitrary strong direct current electric field. Acta Physica Sinica, 2009, 58(12): 8454-8460.doi:10.7498/aps.58.8454 |
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Yang Hang-Sheng.Surface growth mechanism of cubic boron nitride thin films prepared by plasma-enhanced chemical vapor deposition. Acta Physica Sinica, 2006, 55(8): 4238-4246.doi:10.7498/aps.55.4238 |
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Zhang Xiao-Dan, Zhao Ying, Gao Yan-Tao, Zhu Feng, Wei Chang-Chun, Sun Jian, Wang Yan, Geng Xin-Hua, Xiong Shao-Zhen.Study of microcrystalline silicon solar cells fabricated by very high frequency plasma-enhanced chemical vapor deposition. Acta Physica Sinica, 2005, 54(4): 1899-1903.doi:10.7498/aps.54.1899 |
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Yu Wei, Wang Bao-Zhu, Yang Yan-Bin, Lu Wan-Bing, Fu Guang-Sheng.Optical emission diagnosis of helicon-wave-plasma-enhanced chemical vapor deposition of nanocrystalline silicon. Acta Physica Sinica, 2005, 54(5): 2394-2398.doi:10.7498/aps.54.2394 |
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Wang Miao, Li Zhen-Hua, Takegawa Hitosi, Saito Yahachi.Study on the definite direction growth of carbon nanotubes by the microwave plasma-enhanced chemical vapro phase deposition. Acta Physica Sinica, 2004, 53(3): 888-890.doi:10.7498/aps.53.888 |
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Yuan Xing-Qiu, Li Hui, Zhao Tai-Zhe, Wang Fei, Y u Guo-Yang, Guo Wen-Kang, Xu Ping.Study of the characteristic of D.C.arc plasma torch*. Acta Physica Sinica, 2004, 53(11): 3806-3813.doi:10.7498/aps.53.3806 |
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Yang Wu-Bao, Wang Jiu-Li, Zhang Gu-Ling, Fan Song-Hua, Liu Chi-Zi, Yang Si-Ze.Diamond-like carbon films deposited on optical glass substrate by using ECR microwave acetone plasma CVD method. Acta Physica Sinica, 2004, 53(9): 3099-3103.doi:10.7498/aps.53.3099 |
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Yang Hui-Dong, Wu Chun-Ｙa, Zhao Ying, Xue Jun-Ｍing, Geng Xin-Ｈua, Xiong Shao-Ｚhen.Investigation on the oxygen contamination in the μc-Si∶H thin film deposited b y VHF-PECVD. Acta Physica Sinica, 2003, 52(11): 2865-2869.doi:10.7498/aps.52.2865 |
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Yu Wei, Liu Li-Hui, Hou Hai-Hong, Ding Xue-Cheng, Han Li, Fu Guang-Sheng.Silicon nitride films prepared by helicon wave plasam-enhanced chemical vapour deposition. Acta Physica Sinica, 2003, 52(3): 687-691.doi:10.7498/aps.52.687 |
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YE CHAO, NING ZHAO-YUAN, CHENG SHAN-HUA.OPTICAL PROPERTIES OF AMORPHOUS FLUORINATED CARBON FILMS PREPARED BY ELECTRON CYCLOTRON RESONANCE PLASMA. Acta Physica Sinica, 2001, 50(10): 2017-2022.doi:10.7498/aps.50.2017 |
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ZHANG YONG-PING, GU YOU-SONG, GAO HONG-JUN, ZHANG XIU-FANG.STRUCTURAL CHARACTERIZATION OF C3N4 THIN FILMS SYNTHESIZED BY MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION. Acta Physica Sinica, 2001, 50(7): 1396-1400.doi:10.7498/aps.50.1396 |
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NING ZHAO-YUAN, CHENG SHAN-HUA, YE CHAO.CHEMICAL BONDING STRUCTURE OF FLUORINATED AMORPHOUS CARBON FILMS PREPARED BY ELECTRON CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR DEPOSITION. Acta Physica Sinica, 2001, 50(3): 566-571.doi:10.7498/aps.50.566 |
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CHEN XIAO-HUA, WU GUO-TAO, DENG FU-MING, WANG JIAN-XIONG, YANG HANG-SHENG, WANG MIAO, LU XIAO-NAN, PENG JING-CUI, LI WEN-ZHU.GROWING CARBON BUCKONIONS BY RADIO FREQUENCY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION. Acta Physica Sinica, 2001, 50(7): 1264-1267.doi:10.7498/aps.50.1264 |
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YE CHAO, NING ZHAO-YUAN, CHENG SHAN-HUA, KANG JIAN.STUDY ON α-C∶F FILMS DEPOSITED BY ELECTRON CYCLOTRONRESONANCE PLASMA CHEMICAL VAPOR DEPOSITION. Acta Physica Sinica, 2001, 50(4): 784-789.doi:10.7498/aps.50.784 |
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