[1] |
Lu Nai-Yan, Yu Xue-Jian, Wan Jia-Wei, Weng Yu-Yan, Guo Jun-Hong, Liu Yu.Surface plasmon resonance coupling effect of micro-patterned gold film. Acta Physica Sinica, 2016, 65(20): 208102.doi:10.7498/aps.65.208102 |
[2] |
Wu Jun, Ma Zhi-Bin, Shen Wu-Lin, Yan Lei, Pan Xin, Wang Jian-Hua.Influence of nitrogen in diamond films on plasma etching. Acta Physica Sinica, 2013, 62(7): 075202.doi:10.7498/aps.62.075202 |
[3] |
Li Zhi-Jie, Tian Ming, He Lian-Long.Preparation of AlN nanowire macroscopic arrays. Acta Physica Sinica, 2011, 60(9): 098101.doi:10.7498/aps.60.098101 |
[4] |
Huang Qian, Wang Jing, Cao Li-Ran, Sun Jian, Zhang Xiao-Dan, Geng Wei-Dong, Xiong Shao-Zhen, Zhao Ying.Research of surface enhanced Raman scattering caused by surface plasmon of Ag nano-structures. Acta Physica Sinica, 2009, 58(3): 1980-1986.doi:10.7498/aps.58.1980 |
[5] |
Ma Hai-Lin, Su Qing, Lan Wei, Liu Xue-Qin.Influence of oxygen pressure on the structure and photoluminescence of β-Ga2O3 nano-material prepared by thermal evaporation. Acta Physica Sinica, 2008, 57(11): 7322-7326.doi:10.7498/aps.57.7322 |
[6] |
.Localized surface plasmon resonance of half-shell gold film. Acta Physica Sinica, 2007, 56(12): 7219-7223.doi:10.7498/aps.56.7219 |
[7] |
Wang Bi-Ben, Xu Xing-Zi, Zhang Bing.Growth of carbon nanotips by plasma-enhanced hot filament chemical vapor deposition. Acta Physica Sinica, 2006, 55(2): 941-946.doi:10.7498/aps.55.941 |
[8] |
Wang Xiao-Qiang, Li Jun-Shuai, Chen Qiang, Qi Jing, Yin Min, He De-Yan.Aluminum-induced crystallization during deposition of silicon films by inductively coupled plasma CVD. Acta Physica Sinica, 2005, 54(1): 269-273.doi:10.7498/aps.54.269 |
[9] |
Wang Miao, Li Zhen-Hua, Takegawa Hitosi, Saito Yahachi.Study on the definite direction growth of carbon nanotubes by the microwave plasma-enhanced chemical vapro phase deposition. Acta Physica Sinica, 2004, 53(3): 888-890.doi:10.7498/aps.53.888 |
[10] |
Zeng Xiang-Bo, Liao Xian-Bo, Wang Bo, Diao Hong-Wei, Dai Song-Tao, Xiang Xian-Bi, Chang Xiu-Lan, Xu Yan-Yue, Hu Zhi-Hua, Hao Hui-Ying, Kong Guang-Lin.Boron-doped silicon nanowires grown by plasmaenhanced chemical vapor deposition. Acta Physica Sinica, 2004, 53(12): 4410-4413.doi:10.7498/aps.53.4410 |
[11] |
Yang Wu-Bao, Fan Song-Hua, Liu Chi-Zi, Zhang Gu-Ling, Wang Jiu-Li, Yang Si-Ze.Investigation of diamond-like-carbon films deposited on glass substrate by using a pulsed high energy density plasma gun. Acta Physica Sinica, 2003, 52(1): 140-144.doi:10.7498/aps.52.140 |
[12] |
YE CHAO, NING ZHAO-YUAN, CHENG SHAN-HUA, KANG JIAN.STUDY ON α-C∶F FILMS DEPOSITED BY ELECTRON CYCLOTRONRESONANCE PLASMA CHEMICAL VAPOR DEPOSITION. Acta Physica Sinica, 2001, 50(4): 784-789.doi:10.7498/aps.50.784 |
[13] |
CHEN XIAO-HUA, WU GUO-TAO, DENG FU-MING, WANG JIAN-XIONG, YANG HANG-SHENG, WANG MIAO, LU XIAO-NAN, PENG JING-CUI, LI WEN-ZHU.GROWING CARBON BUCKONIONS BY RADIO FREQUENCY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION. Acta Physica Sinica, 2001, 50(7): 1264-1267.doi:10.7498/aps.50.1264 |
[14] |
HU YING.SiC NANOWIRES GROWN ON SILICON(100) WAFER BY MPCVD METHOD. Acta Physica Sinica, 2001, 50(12): 2452-2455.doi:10.7498/aps.50.2452 |
[15] |
MA XI-YING, HE DE-YAN, CHEN GUANG-HUA.SYNTHESIS AND MECHANISM OF BC2N THIN FILMS IN STALK-LIKE GROWTH. Acta Physica Sinica, 2001, 50(10): 2023-2027.doi:10.7498/aps.50.2023 |
[16] |
NING ZHAO-YUAN, CHENG SHAN-HUA.ETCHING PROPERTIES OF AMORPHOUS HYDROGENATED CARBON FILMS IN A MULTIPOLE ELECTRON CYCLOTRON RESONANCE OXYGEN PLASMA SYSTEM. Acta Physica Sinica, 1999, 48(10): 1950-1956.doi:10.7498/aps.48.1950 |
[17] |
XIN YU, FAN SHU-PING, DI GUO-QING, SHEN MING-RONG, GAN ZHAO-QIANG.STUDIES OF CNx FILMS DEPOSITED BY MEANS OF MICROWAVE PLASMA CVD METHOD. Acta Physica Sinica, 1998, 47(1): 154-159.doi:10.7498/aps.47.154 |
[18] |
LIAO KE-JUN, WANG WAN-LU.FRACTURE STRENGTH STUDIES OF POLYCRYSTALLINE DIAMOND FILMS PRODUCED BY DC PLASMA CVD. Acta Physica Sinica, 1994, 43(9): 1559-1563.doi:10.7498/aps.43.1559 |
[19] |
WANG WAN-LU, GAO JIN-TING, LIAO KE-JUN, LIU AN-MIN.STUDIES OF INTERNAL STRESS IN DIAMOND FILMS PREPA-RED BY DC PLASMA CHEMICAL VAPOUR DEPOSITION. Acta Physica Sinica, 1992, 41(11): 1906-1912.doi:10.7498/aps.41.1906 |
[20] |
FU GUANG-SHENG, HAN LI, LI XIAO-WEI, ZHANG LIAN-SHUI, DONG LI-FANG, LU FU-RUN, XUE CHUN-YIN.SILICON FILM DEPOSITED BY LASER-PLASMA. Acta Physica Sinica, 1987, 36(3): 293-300.doi:10.7498/aps.36.293 |