[1] |
.3D Simulation Study on the Mechanism of Influence Factor of Total Dose Ionizing Effect on SiGe HBT. Acta Physica Sinica, 2021, (): .doi:10.7498/aps.70.20211795 |
[2] |
Lin Jian-Xiao, Wu Jiu-Hui, Liu Ai-Qun, Chen Zhe, Lei Hao.A nano-silicon-photonic switch driven by an optical gradient force. Acta Physica Sinica, 2015, 64(15): 154209.doi:10.7498/aps.64.154209 |
[3] |
Liu Jing, Wu Yu, Gao Yong.Research on SiGe heterojunction bipolar transistor with a trench-type emitter. Acta Physica Sinica, 2014, 63(14): 148503.doi:10.7498/aps.63.148503 |
[4] |
Song Jian-Jun, Yang Chao, Zhu He, Zhang He-Ming, Xuan Rong-Xi, Hu Hui-Yong, Shu Bin.Structure design and frequency characteristics of SOI SiGe HBT. Acta Physica Sinica, 2014, 63(11): 118501.doi:10.7498/aps.63.118501 |
[5] |
Wang Bin, Zhang He-Ming, Hu Hui-Yong, Zhang Yu-Ming, Song Jian-Jun, Zhou Chun-Yu, Li Yu-Chen.Study on gate capacitance-voltage characteristics of strained-SiGe pMOSFET. Acta Physica Sinica, 2013, 62(12): 127102.doi:10.7498/aps.62.127102 |
[6] |
Zhang Yu-Jie, Zhang Wan-Rong, Jin Dong-Yue, Chen Liang, Fu Qiang, Guo Zhen-Jie, Xing Guang-Hui, Lu Zhi-Yi.Effects of Ge profile on thermal characteristics of SiGe heterojunction bipolar transistor with non-uniform doping profile in base region. Acta Physica Sinica, 2013, 62(3): 034401.doi:10.7498/aps.62.034401 |
[7] |
Zhang Bin, Yang Yin-Tang, Li Yue-Jin, Xu Xiao-Bo.Electrical behavior research of silicon-on-insulator SiGe heterojunction bipolar transistor. Acta Physica Sinica, 2012, 61(23): 238502.doi:10.7498/aps.61.238502 |
[8] |
Qin Shan-Shan, Zhang He-Ming, Hu Hui-Yong, Qu Jiang-Tao, Wang Guan-Yu, Xiao Qing, Shu Yu.A two-dimensional subthreshold current model for fullydepleted strained-SOI MOSFET. Acta Physica Sinica, 2011, 60(5): 058501.doi:10.7498/aps.60.058501 |
[9] |
Hu Hui-Yong, Shu Yu, Zhang He-Ming, Song Jian-Jun, Xuan Rong-Xi, Qing Shan-Shan, Qu Jiang-Tao.Collector junction depletion-layer width model of SiGeheterojunction bipolar transistor with intrinsic SiGe layer. Acta Physica Sinica, 2011, 60(1): 017303.doi:10.7498/aps.60.017303 |
[10] |
Xiao Ying, Zhang Wan-Rong, Jin Dong-Yue, Chen Liang, Wang Ren-Qing, Xie Hong-Yun.Effect of bandgap engineering on thermal characteristic of radiofrequency power SiGe heterojunction bipolar transistor. Acta Physica Sinica, 2011, 60(4): 044402.doi:10.7498/aps.60.044402 |
[11] |
Yu Zong-Guang, Xiao Zhi-Qiang, Zhou Xin-Jie, Li Lei-Lei.Threshold voltage degradation mechanism of SOI SONOS EEPROM under total-dose irradiation. Acta Physica Sinica, 2011, 60(9): 098502.doi:10.7498/aps.60.098502 |
[12] |
Xu Xiao-Bo, Zhang He-Ming, Hu Hui-Yong, Xu Li-Jun, Ma Jian-Li.A collector space charge region model for SiGe HBT on thin-film SOI. Acta Physica Sinica, 2011, 60(7): 078502.doi:10.7498/aps.60.078502 |
[13] |
Luan Su-Zhen, Liu Hong-Xia, Jia Ren-Xu, Cai Nai-Qiong.2-D analytical modeling of dual material gate fully depleted SOI MOSFET with high-k dielectric. Acta Physica Sinica, 2008, 57(6): 3807-3812.doi:10.7498/aps.57.3807 |
[14] |
Zhang He-Ming, Cui Xiao-Ying, Hu Hui-Yong, Dai Xian-Ying, Xuan Rong-Xi.Study on threshold voltage model of strained SiGe quantum well channel SOI PMOSFET. Acta Physica Sinica, 2007, 56(6): 3504-3508.doi:10.7498/aps.56.3504 |
[15] |
Shu Bin, Zhang He-Ming, Zhu Guo-Liang, Fan Min, Xuan Rong-Xi.Fabrication of SOI material based on smart-cut technology. Acta Physica Sinica, 2007, 56(3): 1668-1673.doi:10.7498/aps.56.1668 |
[16] |
Qiao Ming, Zhang Bo, Li Zhao-Ji, Fang Jian, Zhou Xian-Da.Analysis of the back-gate effect on the breakdown behavior of lateral high-voltage SOI transistors. Acta Physica Sinica, 2007, 56(7): 3990-3995.doi:10.7498/aps.56.3990 |
[17] |
Hu Hui-Yong, Zhang He-Ming, Lü Yi, Dai Xian-Ying, Hou Hui, Ou Jian-Feng, Wang Wei, Wang Xi-Yuan.SiGe HBT large signal equivalent circuit model. Acta Physica Sinica, 2006, 55(1): 403-408.doi:10.7498/aps.55.403 |
[18] |
Zheng Zhong-Shan, Liu Zhong-Li, Zhang Guo-Qiang, Li Ning, Fan Kai, Zhang En-Xia, Yi Wan-Bing, Chen Meng, Wang Xi.Effects of the technology of implanting nitrogen into buried oxide layer on the characteristics of partially depleted SOI nMOSFET. Acta Physica Sinica, 2005, 54(1): 348-353.doi:10.7498/aps.54.348 |
[19] |
Shu Bin, Dai Xian-Ying, Zhang He-Ming.Determination of bandgap in SiGe strained layers using a pn heterojunction C-V. Acta Physica Sinica, 2004, 53(1): 235-238.doi:10.7498/aps.53.235 |
[20] |
Lü Yi, Zhang He-Ming, Dai Xian-Ying, Hu Hui-Yong, Shu Bin.Junction capacitance models of SiGe HBT. Acta Physica Sinica, 2004, 53(9): 3239-3244.doi:10.7498/aps.53.3239 |